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Activity Number
277
Editable
Overview and Learning Objectives
Classroom Practice
Central Concepts
Macro Micro Link
Activity Credits

Atomic Layer Deposition (A 1-page experiment)

Interactive model, with minimal support

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Overview and Learning Objectives

What affects the making of an atomic-scale film such as that used in the printing of circuitry? In this activity, students undertake a simulation of the Atomic Layer Deposition (ALD) technique, a CVD process in which two complementary precursors (e.g., Al(CH3)3 and H2O) are alternatively introduced into the reaction chamber, and build an atomic scale film.

Students will be able to:

  • manipulate the model in order to assemble an atomic-scale film;
  • experiment with temperature and discover its effect on irregularities in this process.

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Classroom Practice

You might link the model to an animation of ALD as used in manufacturing: http://www.cambridgenanotech.com/animation/

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Central Concepts

Key Concept:

Molecules can be layered on top of precursors to build up the thickness of a film useful in atomic-scale manufacturing.

Additional Related Concepts

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Macro Micro Link

This nanoscale technique is useful in the printing of circuitry.

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Activity Credits

using Molecular Workbench

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Last Update: 12/07/2015 Maintainer: CC Web Team (webmaster@concord.org)
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These materials are based upon work supported
by the National Science Foundation under grant numbers
9980620, ESI-0242701 and EIA-0219345

Any opinions, findings, and conclusions or recommendations expressed in this
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the views of the National Science Foundation.