Interactive model, with minimal support
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What affects the making of an atomic-scale film such as that used in the printing of circuitry? In this activity, students undertake a simulation of the Atomic Layer Deposition (ALD) technique, a CVD process in which two complementary precursors (e.g., Al(CH3)3 and H2O) are alternatively introduced into the reaction chamber, and build an atomic scale film.
Students will be able to:
You might link the model to an animation of ALD as used in manufacturing: http://www.cambridgenanotech.com/animation/
Molecules can be layered on top of precursors to build up the thickness of a film useful in atomic-scale manufacturing.
Additional Related Concepts
This nanoscale technique is useful in the printing of circuitry.
using Molecular Workbench
Last Update: 12/07/2015
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9980620, ESI-0242701 and EIA-0219345
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